Selective Recovery Of Strong And Weak Acids And Bases From Semiconductor Wastewater Using Diffusion Dialysis: Mechanisms, Kinetics, And Process Optimization
DOI:
https://doi.org/10.64252/m0pq5110Keywords:
Diffusion dialysis, wastewater treatment, semiconductors, ion-exchange membranes, chemical recoveryAbstract
The rapid growth of the semiconductor industry has led to the generation of large volumes of wastewater containing highly concentrated acidic and basic compounds with significant environmental impact. This study aims to evaluate the efficiency of diffusion dialysis for the selective recovery of strong and weak acids and bases from semiconductor effluents while investigating the mechanisms governing ion transport through ion-exchange membranes. Neosepta-type membranes (AMX and CMX) were used to separate and recover individual and mixed solutions of acids (HCl, HNO₃, H₂SO₄, HF, H₃PO₄, CH₃COOH) and bases (NaOH, KOH, Ba(OH)₂). Results show that ion mobility is influenced by dissociation degree, pKa, molecular size, and distribution constants, explaining differences in permeability and recovery rates. HF demonstrated superior transport among weak acids, while Ba(OH)₂ showed the highest recovery among bases. A simulated HF + Cu²⁺ solution showed 60% HF recovery, confirming membrane selectivity. This work provides a practical framework for understanding selective ion transport and offers a sustainable low-energy alternative for chemical recovery in high-tech industries.